Abstract

In this paper, we propose a Nano-pillar HIT solar cell by using different etching methods. First, we use silvaco TCAD Atlas to simulate and discuss the structure. According to simulation results, we obtain a 25.58% conversion efficiency Nano-pillar HIT solar cell which is better than the conventional HIT solar cell (24.7%) [1]. All of the parameters are the same, which is calibrated form [1]. The front layer of the new solar cell can enhance the light trapping and has the antireflection behavior by using Nano-pillar structure. The surface is also textured so that the short-circuit current density (Jsc) is increased.

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