Impact of metal deposition on the optical and interface properties of NiO: growth and characterization of NiO/metal thin bilayer films

Abstract

Abstract Since transparent conductive oxides (TCOs) provide electrical conductivity together with optical transparency, they have found wide applications in optoelectronic devices and photovoltaics. Among the TCOs, nickel oxide (NiO) is challenging due to its inherent trade-off between transparency and electrical conductivity. To address this challenge, one effective approach is to deposit a metal layer onto NiO thin films. In this work, NiO, NiO/Au, NiO/Ag, and NiO/Cu thin films are prepared by sputtering and thermal evaporation techniques on glass substrates and fully characterized finding the proper film for optoelectronic applications. The electrical and optical properties of the fabricated films are examined by four-point probe measurements and optical spectrometry. According to the obtained results, the NiO/Au, NiO/Ag, and NiO/Cu bilayers show sheet resistance of 200, 338, and 925 Ω sq−1 respectively while their optical bandgaps vary from 3.2 to 3.76 eV. These findings provide valuable insights into the performance of these films, making them potentially viable choices for various optoelectronic applications.