Abstract
The electronic structure of oxygen vacancies in lanthanum-doped hafnium oxide (HfO2:La) is studied using the density functional theory. The simulation is carried out for the optimal structure of HfO2:La in three crystalline phases for an oxygen vacancy involved in the impurity charge compensation that is structural element, as well as for a second purposely added oxygen vacancy. It is shown that the HfO2 doping with La increases the oxygen vacancy content in such a way that the twice positively charged vacancy concentration increases and the neutral one decreases. The doping with La facilitates new oxygen vacancies formation in HfO2. Oxygen vacancies in HfO2:La and HfO2 have a similar electronic structure and are traps for electrons. However, the deeper trap and the electrostatic repulsion caused by the impurity in HfO2:La suppress the vacancies participation in the charge transport. Based on the obtained results, the mechanisms of HfO2-based resistive and ferroelectric memory improvements, when HfO2 doped with lanthanum, are discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
