Impact of InGaN notch on sensitivity in dielectric modulated dual channel GaN MOSHEMT for label-free biosensing

Abstract

The effect of InGaN notch on sensitivity and Dielectric Modulated (DM) Double Heterojunction (DH) dual channel AlGaN/GaN/InGaN/GaN MOSHEMT (Metal Oxide Semiconductor High Electron Mobility Transistor) for detecting the label-free biomolecules has been investigated in this paper. Biomolecules can be inserted into the nanocavity formed by etching the insulating layer under the gate electrode. The insulator (Al2O3) as a dielectric improves the drive current and device sensitivity because of low leakage and high scalability. In this proposed structure, the presence of InGaN notch increases the carrier confinement in the channel, thereby improving the device sensitivity. The device is simulated using Sentaurus TCAD, and the results show a significant increase in drain current (IDS), up to 335 mA/mm. The optimization of the device parameters exhibits a high sensitivity (∼74%), making it suitable for precise label-free biosensing.