Abstract
We describe the impact of various developers on the roughness of dissolution front of electron beam positive-tone resist ZEP7000. In this study, two types of developers are investigated: single-solvent developer and binary-solvent developer. Atomic force microscope observation of dissolution fronts reveal that for a homologous series of n-alkyl acetate as a single-solvent developer, there are three categories of dissolution process: molecular-level dissolution, aggregate extraction development and their intermediate. Small solvent molecules, such as methyl- and ethyl acetate, are very effective for reducing roughness, For good solvents for ZEP resist as single solvent developer, molecular-level dissolution also occurs and the dissolution front becomes very flat and smooth. However, these developers, though effective for reducing roughness, lead to lower dissolution constant. We clarified that binary-solvent developers consisting of these effective developers and n-hexane as a poor solvent, especially 1:1 ethyl acetate/n-hexane developer, provide both low roughness and high dissolution constant.
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