Impact of carrier concentration and bandgap on the performance of double gate GNR-FET

Abstract

Abstract This paper presents the impact of drain carrier density on the drain current saturation of 5 nm channel length double gate graphene nanoribbon field effect transistor (DGGNR-FET) near high drain voltage region. The impact of the substrate and energy band gap on the kink behavior of the device is analyzed by using Nonequilibrium Green's Function with mode space (NEGF_MS) method. We studied the effect of Si, SiC, and the oxide (SiO2) sub'strate on the device performance. The impact of the energy band gap is also examined on the increase in carrier density and current saturation. The necessity of constant carrier density in the drain side for better current saturation is emphasized. The carrier density in the drain side is increased due to the tunnelling from source to drain region (band to band tunnelling) and lateral carrier density modulation. We found that SiC is the better substrate over silicon and SiO2 for better current saturation of DGGNR-FET. Our simulation results provide detailed insight into analog and radio frequency application for the graphene device.