Abstract
Recently, great advances had been made by using scanning probe microscopy (SPM) to quantify the relative permittivity of thin film materials on a nanometer scale. The imaging techniques of permittivity for thin film materials with SPM, especially for photoelectric materials, have not been fully researched until now. Here, we presented a method to image permittivity of thin film materials by using a scanning capacitance microscope (SCM). This method combined the quantitative measurement by using SCM with the capacitance gradient–distance fitting curve to obtain the two-dimensional (2D) permittivity image at room temperature under atmospheric conditions. For the demonstration, a 2D permittivity image of film of molybdenum oxide (MoO3), a kind of photoelectric material, was acquired. From the image, it could be found that the average values of permittivity of MoO3 film and of MoO3 film-doped NaCl were about 8.0 and 9.5, respectively. The experimental results were quantitatively consistent with other experimental results of the same material. The reported technique here could provide a novel method for imaging the relative permittivity with nanometer resolution and be helpful for the study of photoelectric materials.
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