Abstract

New electron microscopes designed to operate with specimens prepared, treated, characterized, and observed in an ultrahigh vacuum environment, provide several techniques for the study of surfaces with atomic or near‐atomic resolution. The method of profile imaging allows the best attainable resolution (1.6 Å) to be applied to determine surface atom positions and atomic motions may be recorded at television rates. Reflection electron microscopy is sensitive to fractions of a monolayer of foreign atoms on a surface and shows atom‐high surface steps with good contrast. Reflection electron energy loss spectroscopy, under surfaces resonance diffraction conditions is sensitive to the composition of surface monolayers. Microdiffraction allows structure analysis of subnanometer particles or crystal defect regions. Spectroscopic analysis or imaging with secondary or Auger electrons provides nanometer resolution on variations of surface composition.

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