Image enhancement in photoemission electron microscopy by means of imaging time-of-flight analysis

Abstract

Photoemission electron microscopy (PEEM) is widely used in combination with synchrotron sources as a powerful tool to observe chemical and magnetic properties of metal and semiconductor surfaces. Presently, the resolution limit of these instruments using soft-X-ray excitation is limited to about 50 nm, because of the chromatic aberation of the electron optics used. Various sophisticated approaches have thus been reported for enhancing the spatial resolution in photoemission electron microscopy. This work demonstrates the use of a simple imaging energy filter based on electron time-of-flight (ToF) selection. The spatial resolution could be improved dramatically, even though the instrument was optimized using a rather large contrast aperture of 50 μm. A special ( x, y, t)-resolving delayline detector was used as the imaging unit of this ToF-PEEM. It is operated in phase with the time structure of the synchrotron source, cutting time intervals from the raw image-forming data set in order to reduce the electron energy width contributing to the final images.