Abstract
AsGa antisite defects formed during plastic deformation of GaAs are identified by electron paramagnetic resonance (EPR) measurements. From photo-EPR results it can be concluded that the two levels of this double donor are located near Ec −0.75 eV and Ev +0.5 eV. These values are coincident with the Fermi level pinning energies at Schottky barriers. The upper level can be related to the ’’main electron trap’’ EL2 in GaAs. Photoluminescence experiments before and after thermal annealing suggest that AsGa defects reduce the near band edge luminescence efficiency. A dislocation climb model is presented which is able to explain AsGa formation during dislocation movement. The production of AsGa antisites during dislocation motion under injection conditions in light emitting devices may thus be connected with degradation of the light output.
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