Hydrosilylation of High Porosity Porous Silicon with 1-Hexene in Supercritical CO2 Fluid

Abstract

Hydrosilylation of organic groups on hydrogen-terminated porous silicon enhances its stability and increasing the porosity of the porous silicon improves its luminescence efficiency. For as-formed thick porous silicon layers with high porosity, however, it is very difficult to preserve its fine structure during air-drying. Here, a process of both drying and hydrosilylation of highly porous silicon in ambient supercritical fluid was developed. 1-hexene was used for the hydrosilylation. The parameters of ambient temperature and processing time have been investigated for optimal process. The effects of the process were evaluated by means of Fourier transform infrared spectroscopy. Supercritical fluid hydrosilylation of porous silicon with thickness of 10 μm and porosity of 80% was achieved. Stable photoluminescence of processed porous silicon was also obtained.