Abstract

Hydrosilylation of organic groups on hydrogen-terminated porous silicon (PSi) enhances its luminescence stability. Increasing PSi porosity improves its luminescence efficiency. However, for as-formed PSi layers with higher porosity than 75%, it is very difficult to preserve its fine structure during air-drying. Here, a process of both drying and hydrosilylation of highly porous silicon in ambient supercritical fluid was developed. 1-hexene was used for the hydrosilylation. Supercritical fluid hydrosilylation of PSi with porosity of 80% was achieved. The effects of the process were evaluated in terms of Fourier transform infrared spectroscopy. Stable photoluminescence of high porosity PSi was also obtained.

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