Abstract
Multilayered thin films of Ti–TiO2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti–TiO2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO2 films. H charging at 1 bar and at 300 °C revealed that, in the case of the tri-layered structure of Ti/TiO2/Ti/Si(111), H diffused through the TiO2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiHx phase (x < 0.66) was formed under such a high H pressure.
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