Hydrogen silsesquioxane resist stamp for replication of nanophotonic components in polymers

Abstract

We investigate an affordable, accurate and large-scale production method to fabricate subwavelength grating structures by hot embossing replication in polycarbonate substrates. We use inorganic hydrogen silsesquioxane (HSQ), a high resolution, binary, negative electron beam resist, on silicon substrate to make a stamp for replication. The stamp is fabricated without any etching processes and with simple process steps. The process starts by spin coating an HSQ-resist layer on a silicon substrate. The desired film thickness is achieved by adjusting the spinning speed and time. The resist material is then subjected to e-beam writing and development followed by a heat treatment to enhance the hardness and to obtain hot embossing stamp material properties comparable with solid SiO2. A comparison with and without the silicon etching is also performed. We demonstrate that a high quality stamp for thermal nano-imprint lithography for optical gratings can be fabricated using an inexpensive process without an etching step. The process results in a uniform imprinting density over the entire grating surface and high imprint fidelity. The reflectance spectra of replicated grating structures are also shown to be in agreement with theoretical calculations.