Abstract
Low hydrogen diffusivity and solubility of aluminum oxide make a vapor deposited aluminum oxide (Al 2O 3) film an anticipated hydrogen permeation barrier coating. In this paper, amorphous Al 2O 3 film was deposited using filtered vacuum arc method. As a substrate, vapor deposited amorphous tungsten oxide (WO 3) film was used in order to characterize hydrogen permeation barrier performance of the Al 2O 3 film utilizing coloration of WO 3 when it forms H x WO 3. The samples were exposed to the flux and angular quantified atomic hydrogen beam, and the degree of coloration was characterized by visible to near infrared range transmission spectroscopy. Using this method, a half-micron thick amorphous Al 2O 3 film reducing atomic hydrogen reaching the underlying WO 3 film to 3×10 −4 was measured. Furthermore, Al 2O 3 film as thin as 20 nm showed atomic hydrogen reduction of 4×10 −3. The results indicate effectiveness of thin vapor deposited Al 2O 3 film as a permeation barrier against atomic hydrogen.
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