Abstract
Colloidal self-assembly and direct micro-patterning of functional materials have drawn intense interest as an alternative to the conventional photolithography based microelectronics fabrication process. In this paper, we introduce a facile subtractive micro contact printing method to create a patterned colloidal nano/micro sphere monolayer on a wafer scale by combining an additive ‘bottom-up’ self-assembly and subtractive ‘top-down’ printing process. A vacuum-assisted contact printing method enabled precise and uniform pressure control to directly fabricate a large-area micro-patterned hexagonally close packed structure of nano/micro spheres on the target substrate very fast, at low cost, under ambient conditions. In addition, analysis on the hybrid printing pressure and the patterning time has been conducted.
Published Version
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