Humidity dependence of microwear characteristics of amorphous carbon films on silicon substrates

Abstract

Influences of environmental humidity on various scanning-scratched wear characteristics, such as long-term stability of wear resistance and load dependence, scratch number dependence and scratch velocity dependence of wear depth, are evaluated by using an atomic force microscope and diamond tips. Amorphous carbon (a-C) films are deposited on silicon substrates by the electron cyclotron resonance plasma (ECR) sputtering method and the RF sputtering method combined with CVD using argon gas containing methane (CH4) as a sputtering gas. In carbon samples with a higher hydrogen content, clear influences of the humidity on various wear characteristics are observed and their wear resistances decrease with increase of the humidity. In the ECR sputtered carbon film with low hydrogen content, wear resistance is stable during long-term exposure to an environment of high temperature and high humidity. In this film, the influences of humidity on the wear resistance and adhesion forces between the films and the substrates are not observed, since it is highly wear resistant and the wear depths are shallow in each test. Thus, amorphous carbon films with low hydrogen content are suitable as wear resistant protective overcoats from the point of view of the wear resistance, in particular the influence of the humidity on the wear resistance including its long-term stability.