Abstract
We present a method for the fabrication of an arrayed one-axis scale grating for a two-probe optical linear encoder using a dual-beam interference lithography (IL) system with a compact diode laser source. We employ a multiple-exposure stitching method to form an arrayed scale grating. This allows a scale grating with small line spacing to be achieved over a large width. This stitched scale grating integrates well with a newly developed two-probe optical encoder, allowing the measurement results to be numerically connected. Since neither the gap width nor the grating phase of the two adjacent gratings must be controlled, the fabrication process is both simplified and made more robust. This flexible and cost-effective fabrication technique can benefit many precision measurement applications. Experiments are carried out to demonstrate the feasibility of this technology.
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