Abstract
Direct write digital holography technique (DWDH) using a single 440-nm pulsed laser exposure has been proposed to record master holograms on commercially available positive-tone photoresist systems based on a mixture of diazonaphthoquinone and novolac resin (DNQ-novolac) of different thicknesses. The DNQ-novo- lac nanocomposite doped with copper nanoparticles (CuNPs) films was also used. The method for numerical evaluation of hologram quality based on reflected beam diffraction intensity measurements was proposed and verified. It was found that all investigated photoresist nanocomposites were sensitive enough to record holo- graphic structures at low single pulse laser exposures (from 3.3 to 18.0 mJ∕cm 2 ). Moreover, doping DNQ-novo- lac nanocomposite with CuNPs s increases its sensitivity to pulsed laser exposure by more than 30%. The potential of single pulsed laser exposures to record high quality master holograms on commercially available and metal nanoparticles doped photoresists with at least five times lower exposures values as compared to the continuous-wave laser exposures usually used to expose photoresist materials in holographic applications, opens the possibility to use pulsed lasers for quick master-originals origination for embossed holograms applying a DWDH technique or analog methods. © 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) (DOI: 10.1117/1.OE.53.9 .097101)
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