Hollow cathode and hybrid plasma processing

Abstract

Generation and features of the radio frequency (rf) hollow cathode discharge (HCD) and its transition into the hollow cathode arc (HCA) are described. Rf linear hollow cathodes for generation of plasma over large areas and suitable for further scale-up are presented. Examples of surface processing and coating by PVD, both by HCD and HCA, are given. The hybrid reactor, combining hollow cathode and microwave plasmas, integrates features of both and provides more options to control plasma characteristics and consequently properties of deposited films. The rf hollow cathodes can be operated in both, PVD and PE CVD regimes, depending on process parameters. These regimes can even be combined within one process. New concepts of fused hollow cathode (FHC), microwave antenna (MWA) and Hybrid hollow electrode activated discharge (H-HEAD) cold atmospheric plasma sources are introduced. The FHC with its modular concept can be used for gas conversion, cleaning and for surface treatment of temperature-sensitive materials at ambient atmosphere. The H-HEAD cold atmospheric plasma source, capable of generating plasma plumes more than 15 cm long, enables treatment of 3-d and complex geometry objects even at low gas flows.