Abstract
In this paper the results from a study of high-voltage pulse stressing effects on resistance and low-frequency noise of thick-film resistors based on two different resistor compositions with sheet resistances of 10 and 100 kΩ/sq are presented. For the experimental purposes thick-film test resistors of different dimensions were realized and exhibited to voltage pulses with 1500 and 3000 V amplitudes. Obtained experimental results are qualitatively analyzed from the microstructure, charge transport mechanism and low-frequency noise aspects. Correlation between resistance and low-frequency noise changes with resistor degradation due to high-voltage pulse stressing is observed. It is shown that low-frequency noise is more sensitive to this kind of resistor stressing than resistance and that measured values of noise index are in agreement with resistance noise spectrum results.
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