High-Temperature Oxidation Behavior and Its Oxide Layer Structure Formed on Ti-Nb Alloys

Abstract

It had been reported that Ti-29Nb-13Ta-4.6Zr (TNTZ) alloy forms a dense oxide layer by high-temperature oxidation whereas CP Ti forms a multilayered oxide consisted of rutile monolayers and void layer. This morphological change is supposed to be mainly caused by Nb addition in Ti since the dense oxide layer of TNTZ consists of multiple oxide phases, at least with rutile TiO2 and TiNb2O7. In this study, high-temperature oxidation at 1273 K for 3.6 ks in the air of Ti-xNb alloys (x=1, 5, 7, 10, 13, 15, 18, 20, 23, 26, 28, 30 and 32 mol%) was investigated to discuss the effect of Nb addition to Ti on its high-oxidation behavior, and on its oxide microstructure. From the results of the SEM observation, an oxide layer with a void layer was formed on Ti-xNb substrate from 1 mol%Nb up to 10 mol%Nb. However, densification of the oxide layer was confirmed at Ti-13Nb. Then, the dense oxide layer was formed up to 32 mol%Nb. XRD results indicated that only rutile-type TiO2 was identified from 1 mol%Nb up to 10 mol%Nb, then both TiO2 and TiNb2O7 were formed from 13 mol%Nb to 32 mol%Nb. These results indicate that dense oxide layer formation attributes to phase separation from TiO2 to TiNb2O7. Until 10 mol%Nb, the thickness of oxide layer was suppressed by Nb addition, whereas the layer thickness increased with increasing Nb content from 13 mol%Nb. The maximum exfoliation resistance of the oxide layer was obtained at 20 mol%Nb. The results of oxide growth rate at each Ti-xNb alloys suggested that Nb diffusion in Ti may rate-determining process of the dense oxide layer formation.