Abstract
Over the last decade, high-resolution x-ray diffractometry andtopography have played a vital role in providing a betterunderstanding of thin film materials and the development ofhigh-quality crystals for devices. As the importance of high-quality thin films and multilayer structures continues togrow, more and more scientists and engineers have found that aknowledge of high-resolution x-ray diffraction and topography isindispensable. This book provides a comprehensive andin-depth guide, both experimentally and theoretically, to the useof high-resolution diffractometry and topography for thecharacterization of materials. The treatise, well designed foreasy use by both beginners and established scientists,effectively brings together updated x-ray techniques and their applications with theunderlying theoretical background. This provides readers with the conceptual and practicaltools necessary to understand how to apply modern x-raytechniques to their own work. The authors have done an excellent job in conveying their personal experience and expertise in the field. They write in a way that makes reading easy. This book is extremely valuable and should be on the bookshelf of every scientist who is engaged in materials research and development or interested in modern x-ray techniques and their applications.
Published Version
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