Abstract
A double-heterostructure NpnP optoelectronic switching device, with an extreme optical sensitivity and low holding power, has been fabricated. A decrease in breakover voltage of 650 mV is obtained at a light illumination of only 5 nW for a 50×50 μm2 device. To achieve this high sensitivity, the surface generation/recombination currents at the edges of the devices have been reduced by passivating the device perimeter with a regrowth of 50 nm AlAs (lowly p doped).
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
