Abstract
A highly reflective x-ray mirror is needed for creating an efficient synchrotron-radiation lithography beamline. Three kinds of deposition methods are therefore compared: electron-cyclotron-resonance (ECR) sputtering, ion-beam sputtering, and conventional vacuum evaporation. These methods differ with respect to the particle energy irradiating a surface: Ions in ECR plasma have energies of 10–100 eV, ion-beam-sputtered particles have energies of 1–10 eV, and vacuum-evaporated particles have energies of about 0.1 eV. The surface roughness and morphology of platinum films are evaluated here by x-ray reflectivity, scanning tunneling micrography, and scanning electron micrography. The three kinds of films differ in surface roughness and morphology. The ECR-sputtered Pt film has the highest x-ray reflectivity and the lowest surface roughness. The minimum surface roughness of a 10-nm-thick ECR-sputtered film is 0.3 nm. Because this film is thick enough to reflect x rays, ECR sputtering seems to be the best method for preparing highly reflective x-ray mirrors.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
