Abstract
This work introduces an additive direct-write nanofabrication technique for producing extremely conductive gold nanostructures from a commercial metalorganic precursor. Gold content of 91 atomic % (at. %) was achieved by using water as an oxidative enhancer during direct-write deposition. A model was developed based on the deposition rate and the chemical composition, and it explains the surface processes that lead to the increases in gold purity and deposition yield. Co-injection of an oxidative enhancer enabled Focused Electron Beam Induced Deposition (FEBID)—a maskless, resistless deposition method for three dimensional (3D) nanostructures—to directly yield pure gold in a single process step, without post-deposition purification. Gold nanowires displayed resistivity down to 8.8 μΩ cm. This is the highest conductivity achieved so far from FEBID and it opens the possibility of applications in nanoelectronics, such as direct-write contacts to nanomaterials. The increased gold deposition yield and the ultralow carbon level will facilitate future applications such as the fabrication of 3D nanostructures in nanoplasmonics and biomolecule immobilization.
Highlights
FEBID39, electron beam curing[40] and post-deposition exposure to water[41,42] and oxygen flux[43] have been utilized to purify various FEBID structures
This study focused on whether and to what extent this additional oxidative enhancement can improve the chemical purity of the gold deposit
The chemical composition was determined by Scanning Electron Microscopy (SEM) EDX
Summary
FEBID39, electron beam curing[40] and post-deposition exposure to water[41,42] and oxygen flux[43] have been utilized to purify various FEBID structures. This work presents a specially enhanced process to deposit highly pure and conductive FEBID Au structures directly, without any post-deposition purification approach. This in situ purification is achieved by the injection of water vapor as a second gas, together with the organometallic precursor simultaneously, during the deposition of Au nanostructures. This injection leads to the highest gold purity obtained so far from a direct deposition. A model is discussed, showing the actual deposition of gold and carbon
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