High-efficiency p–i–n superstrate amorphous Si solar cells on SiOx periodic arrays of three-dimensional microstructure prepared by soft imprinting

Abstract

Efficient amorphous Si thin-film solar cells in a p–i–n superstrate configuration with a high initial conversion efficiency of 10.3% were successfully fabricated on periodically three-dimensional (3D) micropatterned SiOx/glass substrates prepared by soft imprinting. Conformal film deposition on a 3D microstructure was realized owing to the shape of our newly designed 3D pattern and the triode plasma-enhanced CVD technique, which enables the selective transport of favorable film precursors to the substrate surface. The nanoscale surface texture of the front transparent conductive oxide layer was found to be crucial for optical confinement, unexceptionally for amorphous Si solar cells on a 3D microstructure, which results in an improved short-circuit current density.