Abstract
Fe–Co and Fe–Co–Al–O films were prepared by rf magnetron sputtering in an Ar-gas atmosphere. The coercivity (Hc) of the Fe–Co films was greatly decreased by a small amount of Al2O3 addition. However, a film thickness of more than 500 nm is necessary to obtain minimum the Hch (Hc in the hard-axis direction) of 5 Oe. Hch was greatly decreased by using a Ni–Fe underlayer of 0.5–12 nm, and was less than 1 Oe with film thicknesses ranging from 50 to 600 nm for Fe–Co–Al–O films. An amorphous Co–Zr–Nb soft magnetic underlayer was also examined to investigate influence of underlayer crystal structure. A Hch less than 1 Oe was realized for the samples with Co–Zr–Nb underlayer thickness of about 2 nm. Amorphous underlayer films were also effective in improving the soft magnetic properties of Fe–Co–Al–O films. It is finally concluded that combination of a small amount of Al2O3 addition and a soft magnetic underlayer film is essential to obtain small Hch with high saturation magnetic flux density of 2.4 T in a wide range of film thicknesses.
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