High vacuum arc ion plating Cr film for promoting high temperature applicability of Cu

Abstract

Copper-made electrical coils are normally subject to severe oxidation above 300 °C in air and thus are less applicable at elevated temperatures. In this work, a coarse-grained thin Cr film was prepared by high-powered high vacuum arc ion plating for protecting Cu against oxidation and suppressing the abnormal Cr film/Cu interdiffusion at 600 °C. The well-adherent thin Cr film exhibited good oxidation resistance and more importantly almost no interdiffusion with Cu, showing the superior thermal stability of the Cr film/Cu system. It demonstrates great potentials of the Cr film for promoting high temperature applicability of Cu.