Abstract
The thermal stability of Nicalon NL400 at 1573, 1673 and 1773 K has been studied by TGA and XRD. Under an Ar atmosphere, Nicalon pyrolysed severely to crystallize into β-SiC involving the generation of both SiO and CO. Under an O2 atmosphere, the oxide film which formed around Nicalon retarded the pyrolytic reaction of the core. Nicalon coated with a silica film by the previous oxidation treatment pyrolysed hardly at all under an Ar atmosphere, because the film restricted the escape of SiO and CO. Nicalon which was oxidation-treated at 1773 K retained 63% of its original strength after heating at 1773 K under an Ar atmosphere. The amorphous silica film was found to resist rapid thermal cycling between room temperature and elevated temperatures.
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