Abstract
Ordered gold nanoparticle arrays with high lateral density of6.87 × 1010 nanoparticlescm−2, which are stable upto temperatures of 600 °C, were fabricated. To this end, nanoparticles formed by thermal vacuum evaporation of Auwere immobilized within the pores of nanoporous silicon wafers prepared by blockcopolymer lithography coupled with dry plasma etching. Even after high-temperaturetreatment the degree of order imposed by the block copolymer template wasretained. Optionally, a nanoporous silicon nitride mask can cover the nanoporoussilicon.
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