High Sensitivity of Hydrogen Sensing Through N-polar GaN Schottky Diodes

Abstract

AbstractN-polar and Ga-polar GaN grown on c-plane sapphire by a metal-organic chemical vapor deposition (MOCVD) system were used to fabricate platinum deposited Schottky contacts for hydrogen sensing at room temperature. Wurtzite GaN is a polar material. Along the c-axis, there are N-face (N-polar) or Ga-face (Ga-polar) orientations on the GaN surface. The Ohmic contacts were formed by lift-off of e-beam deposited Ti (200 Å)/Al (1000 Å)/Ni (400 Å)/Au (1200 Å). The contacts were annealed at 850°C for 45 s under a flowing N2 ambient. Isolation was achieved with 2000 Å plasma enhanced chemical vapor deposited SiNx formed at 300°C. A 100 Å of Pt was deposited by e-beam evaporation to form Schottky contacts. After exposure to hydrogen, Ga-polar GaN Schottky showed 10% of current change, while the N-polar GaN Schottky contacts became fully Ohmic. The N-polar GaN Schottky diodes showed stronger and faster response to 4% hydrogen than that of Ga-polar GaN Schottky diodes. The abrupt current increase from N-polar GaN Schottky exposure to hydrogen was attributed to the high reactivity of the N-face surface termination. The surface termination dominates the sensitivity and response time of the hydrogen sensors made of GaN Schottky diodes. Current-voltage characteristics and the real-time detection of the sensor for hydrogen were investigated. These results demonstrate that the surface termination is crucial in the performance of hydrogen sensors made of GaN Schottky diodes.