Abstract
As the higher and higher demand for image definition of flat-panel display (FPD), the minimum linewidth of pixel electrode, which is based on the Indium-Tin-Oxide (ITO) glass, has become narrower and narrower. The feature size of sub-pixel electrode has been narrowed from about 60~100 µm to below 20 µm in recent years. Hence the lithography technology has played a more and more important role in the fabrication of FPD. The laser projection imaging (LPI) technology can solve the problems obviously. In this paper, by using of the 351nm XeF excimer laser projection imaging system we can obtain developed pictures at the resolution between 10 and 20 µm on the ITO glass. In addition, the relation graphs between 10~20 µm linewidth and the modulation transfer function（MTF）of the projection system are simulated and analyzed by the ZEMAX and MATLAB software. Consequently, our system can satisfy the linewidth of the sub-pixel electrode at the resolution between 10 and 20 µm in the production of FPD.
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