High Resolution Electron Microscopy of Semiconductor Defects

Abstract

Any attempt to study the relationship between the electronic and atomic struc ture of isolated defects in semiconductors by high resolution electron microscopy must deal with the following difficulties: (i) The limited point reso lution of modern TEM instruments, which has fallen by about 1Å from 3.8Å to 2.8Å (with tilt) over the last decade. This is still not sufficient to resolve the individual atomic columns in any semiconductor. (ii) The fundamental difficulties in obtaining both high spatial resolution structural information and high energy resolution spectroscopic data from the same, isolated, defect. (iii) The considerable difficulties in extracting chemical, or atomic number information from electron scattering and imaging experiments with high spatial resolution. Among other problems, the separation of composition variation effects from those of thickness is an important problem. Some of our recent approaches to these problems are outlined below.