High resolution AFM Moiré technique for the detection of defects in nano structure

Abstract

Moiré interferometry is a useful technique to assess the reliability of electronic package because Moiré interferometry can measure the whole-field and real-time deformations. The optical limitation of Moiré interferometry makes ambiguous the shear strain of a micro area. An atomic force microscope (AFM) is used to measure the profile of a micro site. High resolution of AFM can apply to the Moiré technique. AFM Moiré technique is useful to measure the strain of a small area. Also, AFM Moiré technique is used to detect of defects in nano structure. In this research, the method to accurately measure the deformation of a small area by using AFM Moiré is proposed. A phase-shifting method is applied to improve the resolution of AFM Moiré.