Abstract
Pulsed Laser Deposition (PLD) has been shown to be an effective method for producing a wide variety of thin films of high-value-added materials. The high average powers and high pulse repetition frequencies of lasers under development at LLNL make it possible to scale-up PLD processes that have been demonstrated in small systems in a number of university, government, and private laboratories to industrially meaningful, economically feasible technologies. A copper vapor laser system at LLNL has been utilized to demonstrate high rate PLD of high quality diamond-like-carbon (DLC) from graphite targets. The deposition rates for PLD obtained with a 100 W laser were {approx} 2000 {mu}m{center_dot}cm{sup 2}/h, or roughly 100 times larger than those reported by chemical vapor deposition (CVD) or physical vapor deposition (PVD) methods. Good adhesion of thin (up to 2 pm) films has been achieved on a small number of substrates that include SiO{sub 2} and single crystal Si. Present results indicate that the best quality DLC films can be produced at optimum rates at power levels and wavelengths compatible with fiber optic delivery systems. If this is also true of other desirable coating systems, this PLD technology could become an extremely attractive industrial tool for high value added coatings.
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