Abstract
This paper concerns with a new reactive magnetron sputtering technique using a zinc target and pure oxygen gas. A solenoid coil around a bell jar was used to improve an increase in the parallel component of the leakage magnetic lines to the target surface. Highly oriented ZnO films (c-axis orientation) were fabricated on glass and on (111) gold substrates. Deposition rate reached 10 µm/h at 500 mA. The quality of the ZnO film was determined by X-ray diffraction, reflection electron diffraction (RED), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Deviation σ on the glass substrate is 1.67°. Excellent ZnO films were obtained at relatively high oxygen gas pressures, 0.25 Torr on glass and 0.55 Torr on (111) gold substrate. Low temperature sputtering is possible for small discharge current.
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