Abstract
Photocatalytic TiO2 films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced TiO2−x target (2−x=1.986; conductivity, 3.7 S cm−1; density, 4.21 g/cm3). The variation in the deposition rate as a function of the O2 flow ratio did not show a hysteresis curve at the “transition region” as seen in the case of a Ti metal target. The deposition rate using the TiO2−x target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an “oxide mode.” The films postannealed in air at temperatures ≥200 °C showed excellent photodecomposition characteristics of acetaldehyde (CH3CHO) as well as photoinduced hydrophilicity.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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