Abstract
This chapter discusses the high quality thin film formation with gas cluster ion beam assisted deposition system. Demand of optical multilayer thin films increased due to the expansion of broadband optical tele-communication systems. In this application, film characteristic to optical filter have narrow band width, high optical transmission and high durability. The film should be of high density and the film interface should be flat. The chapter is to find the optimum deposition conditions in O2-GCIB (gas cluster ion beam) assisted deposition for high quality Ta2O5 and Nb2O5 optical films with high density, high-refractive index, low extinction coefficient, low surface roughness and high humidity. The film properties and structures are explored under various deposition conditions and environmental test are performed to study the stability of the interference filters.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
