Abstract
Nanoimprint lithography (NIL) is a very promising technology for nano structure fabrication, because of its high resolution, low cost and high throughput. In this paper, we have demonstrated high-resolution rectangular Bragg gratings for DFB LD by NIL technology. For the manufacture of high quality gratings, the stamp types and residual resist thickness are discussed, and an improved Simultaneous Thermal and UV (STU) imprint process with temperature-pressure variation is introduced.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
