Abstract

We demonstrate a high-power on-chip 1550-nm laser implemented by passive flip-chip integration of a curved-channel, double-pass InGaAsP/InP slab-coupled optical waveguide amplifier (SCOWA) onto a photonic integrated circuit (PIC) containing a silicon nitride (SiN) waveguide and distributed Bragg reflector (DBR) grating. The combined chip-scale SCOW external cavity laser (SCOWECL) has single mode emission with 312 mW of optical power at a drive current of 2.5 A, and exhibits a side mode suppression ratio (SMSR) of 55 dB, peak photon conversion efficiency (PCE) of 10%, low relative-intensity noise (RIN) of ~160 dB/Hz, and an integrated linewidth of 192 kHz. Additionally, we demonstrate a multi-wavelength SCOWECL array comprised of four SCOWAs coupled to SiN-waveguide DBR gratings. The four-element array generates 80 mW per channel when the SCOWAs are driven in parallel (1.25 A/channel) with ~1-nm wavelength spacing centered at 1533 nm. We describe the fabrication and hybrid integration processes. The measured SCOWA-to-waveguide coupling loss is estimated to be 1.6 +/-1.0 dB which agrees well with the simulation.

Highlights

  • Photonic integrated circuits (PICs) utilizing silicon or silicon nitride (SiN) waveguides have gained prominence as the leading photonic platforms to support a wide variety on-chip optical processing applications

  • We demonstrate a high-power on-chip 1550-nm laser implemented by passive flip-chip integration of a curved-channel, double-pass InGaAsP/InP slab-coupled optical waveguide amplifier (SCOWA) onto a photonic integrated circuit (PIC) containing a silicon nitride (SiN) waveguide and distributed Bragg reflector (DBR) grating

  • We describe development of a high power external-cavity laser (ECL) that is formed by hybrid integration of an 8-mm-long double-pass InGaAsP/InP SCOWA with a low-loss (0.2 dB/cm) SiN waveguide [1] containing a 18-mm-long distributed Bragg reflector (DBR) grating

Read more

Summary

Introduction

Photonic integrated circuits (PICs) utilizing silicon or silicon nitride (SiN) waveguides have gained prominence as the leading photonic platforms to support a wide variety on-chip optical processing applications. For applications requiring manipulation of wavelengths outside the telecom regime (100 mW) where silicon begins to suffer from increased optical loss due to two-photon absorption (TPA), SiN waveguides are preferred [1]. In both PIC waveguide systems, there is a lack of availability of a native light source, requiring integration of light emitters fabricated from direct bandgap materials. The hybrid integration is accomplished by the fabrication of a photonic multi-chip module submount featuring a SiN waveguide that is encapsulated in a thick silicon oxide cladding layer. We estimate the coupling loss between the SCOWA device and PIC and compare it to a finite-difference time-domain (FDTD) simulation of coupling loss

Photonic Multi-Chip Module Submount
SCOWA Device Fabrication
Hybridization
Laser Testing
Coupling Loss Measurement
Coupling Loss Analysis
Findings
Conclusion
Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.