Abstract
Seeking high drive current, low leakage and swift switching is critical in developing high performance thin film transistors (TFTs) for portable and flexible displays. In this work, we report on the fabrication of high performance TFTs, based on orderly in-plane silicon nanowire (SiNW) array grown at 350 °C, which demonstrate a high ON/ OFF current ratio of $5{\times }{{10}}^{{8}}$ , with a steep subthreshold swing (SS) of 100 mV/dec and a hole mobility of 80 cm2/Vs. The high on current of ${10}~{\mu } {A}$ has been obtained under ${{{0.75} }}{V}$ bias for a channel consisting of only 10 parallel SiNWs, with a mean diameter of ${\sim 66}{\textit {nm}}$ and channel length of ${{2}}~{\mu } {m}$ . In addition, SiNW inverters are also constructed, operating at a drive voltage of 2 V and achieving a gain above 11. These results highlight the geometric advantage of the SiNW TFTs in constructing a new generation of high performance, low cost and scalable display logics and flexible electronics.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.