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Abstract
Perovskite X-ray detectors are recognized as the most promising candidates for low-dose detectors due to their superior performance. However, it is still full of challenging in the fabrication of flat-panel X-ray imagers (FPXIs), primarily due to the absence of large area thick films that exhibit high uniformity and long-term performance stability. A general synthesis route is urgently needed to grow large-scale halide perovskite thick films directly on a pixeled thin-film transistor (TFT) backplane with high uniformity, closing the gap between the great potential of perovskite X-ray detectors and their entry into the market. In this work, an advanced precursor paste suitable for blade coating is developed to enable high-throughput manufacturing of FPXIs. Highly uniform perovskite films with a thickness of 300-micrometers are directly deposited onto pixeled TFT substrates by the blade-coating method using the above paste, which governs a stable dark current and minimal noise of the X-ray detectors. As a result, (BA)2(MA)9Pb10I31 perovskite X-ray detectors achieved a high sensitivity of 15200 µC Gyair -1 cm-2 and a limit of detection (LoD) of 26.8 nGyair s-1. Moreover, FPXIs with a spatial resolution of 0.95 lp mm-1 (0.475 lp pixel-1) are obtained, which exhibits negligible signal crosstalk and excellent X-ray imaging performance.
Published Version
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