Abstract

A study of the spatial occurrence of iron precipitation in a high performance multicrystalline silicon (HPMC-Si) sample is presented. The separated effects of grain-boundaries, sparse intra-granular dislocations, and dislocation clusters are investigated by combining the Fei imaging method with glow discharge mass spectroscopy, electron backscatter diffraction, and two iron precipitation models. While the area-averaged precipitation at grain boundaries is relatively minor, almost the whole iron precipitation occurs within the grains, despite the very low intra-granular dislocation density. The fraction of non-precipitated iron in the studied HPMC-Si material was found to be one to two orders of magnitude higher than that reported previously for standard materials.

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