Abstract
Due to its large absorption coefficient and high carrier mobility, SnS exhibits strong promise in the area of optoelectronic devices. Nevertheless, the fabrication of large-area, high-quality films for SnS photodetectors (PDs) with superior photoresponse remains a formidable task, seriously limiting its further practical application. In the present study, we report a superior-performance broadband PD founded on the epitaxial SnS film. Large-area uniform SnS films were grown epitaxially on (100)-oriented KBr using magnetron sputtering technique, further exfoliated, and transferred in a wafer size to fabricated two-ends PD devices. Benefitting from high crystallization and unique photoconductive-bolometric coupling effect, the two modes of operation exhibit a wide range of spectral responses from the visible to near-infrared wavelength (405–1920 nm). Particularly noteworthy is the SnS device fabricated, which demonstrates an impressive responsivity of 95.5 A W−1 and a detectivity of 7.8 × 1011 Jones, outperforming other devices by 1–2 orders of magnitude. In addition, SnS PD shows excellent environmental durability. This work provides a robust approach to develop high-performance broadband SnS PDs, while simultaneously offering deep insight into the light–matter interactions.
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