Abstract

We propose crystalline ZnSnO3 as a new channel material for field-effect transistors. By molecular-beam epitaxy on LiNbO3(0001) substrates, we synthesized films of ZnSnO3, which crystallizes in the LiNbO3-type polar structure. Field-effect transistors on ZnSnO3 exhibit n-type operation with field-effect mobility of as high as 45 cm2V−1s−1 at room temperature. Systematic examination of the transistor operation for channels with different Zn/Sn compositional ratios revealed that the observed high-mobility reflects the nature of stoichiometric ZnSnO3 phase. Moreover, we found an indication of coupling of transistor characteristics with intrinsic spontaneous polarization in ZnSnO3, potentially leading to a distinct type of polarization-induced conduction.

Highlights

  • The successful development of In-Ga-Zn-O field-effect transistors[1] (FETs) has given a boost to the continuing search for new transparent oxide semiconductors

  • High-mobility field-effect transistor based on crystalline ZnSnO3 thin films

  • Crystalline phases are known to exist at certain stoichiometric compositions, but attention has been paid to search for optimal compositions in their amorphous alloy phase diagrams towards high-performance FETs, rather than properties of specific phases

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Summary

Introduction

The successful development of In-Ga-Zn-O field-effect transistors[1] (FETs) has given a boost to the continuing search for new transparent oxide semiconductors. High-mobility field-effect transistor based on crystalline ZnSnO3 thin films

Results
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