Abstract

In the presence of a lateral periodic potential modulation, two-dimensional electrons may exhibit interesting phenomena, such as a graphene-like energy-momentum dispersion, Bloch oscillations, or the Hofstadter butterfly band structure. To create a sufficiently strong potential modulation using conventional semiconductor heterostructures, aggressive device processing is often required, unfortunately resulting in strong disorder that masks the sought-after effects. Here, we report a novel fabrication process flow for imposing a strong lateral potential modulation onto a capacitively induced two-dimensional electron system, while preserving the host material quality. Using this process flow, the electron density in a patterned Si/SiGe heterostructure can be tuned over a wide range, from 4.4 × 1010 cm−2 to 1.8 × 1011 cm−2, with a peak mobility of 6.4 × 105 cm2/V·s. The wide density tunability and high electron mobility allow us to observe sequential emergence of commensurability oscillations as the density, the mobility, and in turn the mean free path, increase. Magnetic-field-periodic quantum oscillations associated with various closed orbits also emerge sequentially with increasing density. We show that, from the density dependence of the quantum oscillations, one can directly extract the steepness of the imposed superlattice potential. This result is then compared to a conventional lateral superlattice model potential.

Highlights

  • In the presence of a lateral periodic potential modulation, two-dimensional electrons may exhibit interesting phenomena, such as a graphene-like energy-momentum dispersion, Bloch oscillations, or the Hofstadter butterfly band structure

  • From the density dependence of the quantum oscillations, one can directly extract the steepness of the imposed superlattice potential

  • We present a fabrication process flow for building a capacitively induced 2DEG in a lateral superlattice potential

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Summary

Introduction

In the presence of a lateral periodic potential modulation, two-dimensional electrons may exhibit interesting phenomena, such as a graphene-like energy-momentum dispersion, Bloch oscillations, or the Hofstadter butterfly band structure. We report a novel fabrication process flow for imposing a strong lateral potential modulation onto a capacitively induced two-dimensional electron system, while preserving the host material quality Using this process flow, the electron density in a patterned Si/SiGe heterostructure can be tuned over a wide range, from 4.4 × 1010 cm−2 to 1.8 × 1011 cm−2, with a peak mobility of 6.4 × 105 cm2/V·s. A shortened mean free path masks effects arising from large electron orbits in a magnetic field, and leads to a reduced phase coherence length, making band structure engineering challenging One metric for this degradation in material quality is the ratio of zero-magnetic-field mobilities before and after patterning (μs/μ0), which is typically of the order of 10–100 for deep etched devices[6,9,28,32,33,35]. This method is irreversible until a thermal cycling of the device is performed, and the density tuning is not precise

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