Abstract
High current ion implantation technology has been getting a great deal of attention in the fields of surface modification and new material formation. For such diverse applications a high current implanter with a sputter-ion source has been developed and stable production of metal ion beams has been demonstrated. High melting point metal ions such as Cr +, Fe + and Pd + were successfully extracted at a beam current of 420, 340, and 260 μA, respectively. A monitor system of metal vapor production for a stable beam has been tested using an optical spectrometer and its usefulness was confirmed.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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