High average power ultrafast amplifier for micromachining applications

Abstract

We demonstrate a directly diode-pumped femtosecond regenerative amplifier with up to 2.5mJ pulse energy at a repetition rate of several kHz. Chirped pulse amplification is applied in order to eliminate non linear effects and to avoid damage of optical components during the amplification process. We use Ytterbium doped materials for femtosecond pulse amplification and high average power operation. The laser system is compact and robust source in order to answer the need of high energy and high average power for micro and nanomachining applications. Average power up to 15W at pulse repetition rates up to 100 kHz are also demonstrated with the same system. This wide operating range means that the laser can be used for many different processes.We demonstrate a directly diode-pumped femtosecond regenerative amplifier with up to 2.5mJ pulse energy at a repetition rate of several kHz. Chirped pulse amplification is applied in order to eliminate non linear effects and to avoid damage of optical components during the amplification process. We use Ytterbium doped materials for femtosecond pulse amplification and high average power operation. The laser system is compact and robust source in order to answer the need of high energy and high average power for micro and nanomachining applications. Average power up to 15W at pulse repetition rates up to 100 kHz are also demonstrated with the same system. This wide operating range means that the laser can be used for many different processes.