Abstract

This work reports filling of blind-hole, high aspect ratio (AR) nano trenches by NiP electroless deposition (ELD) enabled under supercritical carbon dioxide (SC-CO 2 ). SC-CO 2 ELD effectively filled blind trenches with AR ≤ 1:60 (diameter: 83 nm, depth: 5 µm), which was twice higher compared to that achieved by conventional ELD under similar experimental conditions. No pre-deposition of seed layers or surface pre-treatment to increase wettability was performed, and trench filling was achieved only through application of SC-CO 2 . Moreover, P content in the nanowires was found to vary according to nano trench aspect ratio.

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